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Semiconductor Manufacturing

Semiconductor manufacturers demand precise instrumentation to ensure the integrity and efficiency of their production processes. Are you anticipating the challenges of working at ever-smaller scale? Are you ready to drive efficient semiconductor manufacturing?

Meet Tomorrow's Challenges with Nanoscale Expertise — Tools Essential for Ensuring Precision, Quality Control, and Reliability

We offer cutting-edge solutions tailored to the unique (nanoscale) challenges of the semiconductor manufacturing market. With our advanced instrumentation and expertise, we provide critical tools for process control, quality assurance, and cleanroom monitoring.

Stay ahead of the competition — trust TSI and MSP as your go-to partners to help you overcome the nanoscale challenges to your semiconductor production processes.

Cleanroom environment with semiconductor manufacturing

Cleanroom Air Quality Monitoring

Airborne particle contamination monitoring to meet cleanroom audits.

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CMP Slurry Characterization image

CMP Slurry Characterization

Abrasive particle sizing beyond conventional optical measurement methods.

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Gas and Liquid Filtration image

Gas and Liquid Filtration

Maintaining the cleanliness of distribution lines leading to the production processes.

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Data flow and electronics manufacturing

Particle Detection in High-Purity Gases

Preventing electronic defects by gas particle detection.

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Engineer in cleanroom looking at semiconductor wafer

Parts Cleanliness Testing

Precise cleanliness testing crucial for electronics.

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Macro of silicon wafer in semiconductor industry

Surface Defect Inspection

Detect and mitigate killer defects in electronics.

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Silicon wafer in a clean processing room being hold by an engineer

Thin Film Deposition & Removal

Vapor delivery solutions for ALD and CVD.

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Ultrapure Water Monitoring image

Ultrapure Water Monitoring

Nanoparticle detection down to 10 nm.

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CMP Slurry Characterization Using the Scanning Mobility Particle Sizer (SMPS) with TSI Generator

Application Note About Silica Slurry

Wafer slurry being polished

CMP Slurry Characterization Using the Scanning Mobility Particle Sizer (SMPS) with TSI Generator

Application Note About Silica Slurry

The Nano LPM™ Generator + SMPS technique aerosolizes a diluted slurry sample and measures individual dried particles by electrical mobility — identifying distinct particle size peaks in about 2 minutes per scan.

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Wafer slurry being polished

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Reduce Risk of Contamination in Semiconductor Manufacturing By Detecting Particles Down to 2 nm

We offer cutting-edge technology for detecting particles as small as 2 nm, crucial for minimizing contamination risks in semiconductor manufacturing. Our precise instruments provide data to proactively maintain semiconductor production environments, ensuring compliance with industry standards and reducing the risk of defects. With solutions for parts cleanliness testing and particle detection in high-purity gases, we empower manufacturers to make informed decisions and maintain process integrity.

Repeatable Contamination Standards for Inspection Tool Calibration

Additionally, our MSP Particle Deposition Systems enhance calibration of semiconductor inspection tools by depositing particles as small as 10 nm, ensuring accurate and repeatable measurements.

Delivering Consistent Thin Film Deposition

Our MSP Turbo II™ Vaporizers deliver consistent thin film deposition in Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD).Our comprehensive range of products includes particle counters and contamination control systems as well as vaporizers and contamination standards for inspection tool calibration, enabling semiconductor fabs to achieve optimal yields, minimize defects, and ensure compliance with industry standards.

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