Particles shedding semiconductor wafer

Ensuring Parts Cleanliness to Enhance Semiconductor Manufacturing Quality

A Customer Story

At the forefront of the Japanese semiconductor industry, a leading supplier of fluid control and vaporization systems was determined to take the quality of its products to a new level. The Production Engineer of this prestigious company set out to ensure the cleanliness of parts and components, focusing in particular on releasing zero particle during manufacturing processes.

Before the company chose to adopt TSI's solution, they were reaching their limits when it came to sampling particle shedding. With their existing method, they could only detect particles above 100 nm, which left a significant gap in monitoring particles below 10 nm, which are critical to the latest semiconductor manufacturing process.

TSI's WCPC 3789 allows to measure particles below 10 nm to meet the stringent cleanliness requirements in semiconductor manufacturing.Committed to Delivering Defect-free Products to Their Customers

The company set themselves ambitious goals. They were looking for a solution that would allow them to measure particles below 10 nm to ensure they meet the stringent cleanliness requirements required in semiconductor manufacturing.

TSI's solution was groundbreaking: Water-based Condensation Particle Counter 3789 (WCPC). This state-of-the-art particle counter became the cornerstone of this company’s quality control strategy.

Verifying Particle Shedding with the TSI’s WCPC

In 2023, the said company made the strategic decision to invest in the TSI 3789 WCPC. With the strong support of TSI and local partner, the company seamlessly integrated this advanced particle counter into its production line.

By using the 3789 WCPC, the Production Engineer improved the quality of various semiconductor products, including gas and liquid mass flow controllers and liquid vaporization systems. The device was used to verify particle shedding before products were shipped to their demanding customers.

Enabled to Gain the Edge

The implementation of TSI's 3789 WCPC was an important milestone for this company. "It allowed us to control particle contamination and ensure that our products meet the stringent requirements" said the Japanese customer.

By leveraging the precision and sensitivity of the 3789 WCPC, they gained a competitive advantage in the industry. The company could now guarantee superior product quality that exceeded even the stringent requirements of the IDM/Foundry processes.

The decision to partner with TSI was based on confidence in TSI's excellent reputation in particle measurement technology and a previous strong R&D relationship. The company recognized TSI's commitment to innovation and reliability, which made TSI the first choice for improving its quality control standards.

Parts Cleanliness Goal Exceeded

By working with TSI and utilizing the 3789 WCPC, this Japanese company has not only met, but exceeded their goal of ensuring particle-free manufacturing process for semiconductor components. With TSI's solution on their side, they continue to lead the way in delivering unparalleled product cleanliness and performance to their valued customers.

 

Learn More About Parts Cleanliness Testing and Which Solutions We Provide - Click Here.
 

Related Resources

Empowered to Ensure 0.3 µm Particle-Free Environments

A Korean semiconductor leader sought TSI's help to monitor 0.3 µm particles. TSI's AeroTrak™+ Remote Particle Counter provided the solution, ensuring consistent monitoring and meeting cleanliness goals.

Read Customer Story

How do manufacturers manage product risk using cleanroom monitoring data?

Real-time monitoring ensures compliance, aids in root cause analysis, and supports continuous improvement, enhancing overall operational efficiency and regulatory adherence.

Read More

Consequences of Inadequate Parts Cleanliness Testing

Poor testing can lead to low product quality and revenue loss. Using TSI particle counters enables real-time contamination detection, supporting process optimization and higher manufacturing efficiency.

Read More