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Process Control Detection to 10 nm

Ultrapure Water Monitoring

Monitoring ultrapure water down to 10 nm in semiconductor manufacturing is crucial for ensuring the highest purity levels. This precision prevents contamination, which can lead to defects in microchips, ensuring optimal performance and yield. It also supports the production of advanced, high-density integrated circuits essential for modern technology. Click here to learn about locations for ultrapure water monitoring in semiconductor manufacturing.

Importance of Real-Time UPW Monitoring

Real-time UPW monitoring ensures consistent semiconductor production quality by detecting contaminants early. Traditional methods struggle with nanoparticles below 20 nm, making advanced detection technologies essential.

Overcoming Optical Limitations in UPW Monitoring

Optical-based sensors face challenges detecting nanoparticles due to refractive index variations and microbubble interference. Advanced systems like the TSI Nano LPM™ System improve accuracy down to 10 nm.

Impact of Nanoparticle Contamination on Semiconductor Yield

Even 10 nm particles in UPW can reduce semiconductor yield and reliability. Reliable real-time monitoring prevents contamination-related defects, ensuring high-quality manufacturing outcomes.

Meeting Manufacturers Challenges

Real-Time, High-Purity Measurements

Continuous monitoring is essential, but achieving real-time detection without introducing contamination or measurement drift is difficult. Instruments must have minimal interference and high sensitivity.

Frequently asked questions

Q. Why is detecting silica so important as compared to other optical-based technologies?

Silica is a dissolved inorganic material that causes significant damage to wafers. Semiconductor manufacturers spend millions of (Dollars, Euros, Won...) to filter UPW and remove silica, because if silica is in the UPW it easily causes wafer defects. The Nano LPM™ System is the ONLY liquid particle monitor that can detect silica in UPW, so customers can take action before it affects product quality.

Q. What about instrument-to-instrument repeatability and reproducibility?

Over two years of testing in semiconductor UPW sites has demonstrated that two instruments, side-by-side, sampling the same UPW source far exceeds repeatability and reproducibility data as compared to optical-based liquid particle counters. 

Q. What checks can we perform to ensure the TSI Nano LPM™ System is correctly operating?

You can directly inject a particle challenge into the Nano LPM™ System’s injection port. Within minutes, you will see a response that assures you the Nano LPM™ System is working as designed. Also, the Nano LPM Software (included) monitors the Nano LPM™ System’s health —pressures, temperatures, flows and pump status are some of the key parameters monitored. 

Q. How does the TSI Nano LPM™ System fill a technology gap that current optical Liquid Particle Counters (LPCs) cannot meet?

Detection of nanoparticles below 20nm is only possible by using CPC (Condensation Particle Counter) technology.  The TSI Nano LPM™ System utilizes a patented aerosolizer that provides 10 nanometer detection not possible with optical instruments, providing critical information to enable customers to make data driven decisions on the quality of their UPW.

Q. Want to know more nanoparticle monitoring in ultrapure water? Review more FAQs.

Click here to review a comprehensive list of frequently asked questions about nanoparticle monitoring in UPW, and to learn the advantages in using the TSI Nano LPM™ System.