Liquid Particle Instrument

Critical Monitoring for Ultra-Pure Water

As semiconductor nodes advance, the purity of Ultra-Pure Water (UPW) becomes increasingly critical. UPW is the most widely used chemical in the fab, and even trace contamination can lead to catastrophic yield loss. The TSI® Nano LPM™ System offers a breakthrough in liquid monitoring technology, enabling facility managers to see what was previously invisible. By detecting particles down to 10 nm, this system provides an early warning of filtration issues or system contamination, helping to avoid the processing of wafers with compromised water.

Overcoming Optical Limitations

Traditional liquid particle counters rely on light scattering, which loses sensitivity as particle size decreases, especially when the particle's refractive index matches that of water. The Nano LPM™ System utilizes a different approach that operates independently of refractive index, allowing it to detect silica, metallic, and organic particles with equal efficiency. This capability helps eliminate the false negatives common with older technologies and provides a truer picture of water quality.

Real-Time Data for Proactive Control

Waiting for lab results or grab samples can delay necessary corrective actions. The Nano LPM™ System delivers real-time data, enabling immediate response to water quality excursions. This continuous stream of data supports detailed trending and analysis, helping engineers optimize filtration cycles and predict maintenance needs. By integrating this advanced monitoring capability into your UPW system, you can better manage process risks and support the stringent cleanliness requirements of modern semiconductor fabrication.