Nanoparticle Monitoring in UPW

Liquid Particle Instrument

Ultra-pure water (UPW) plays a crucial role in semiconductor manufacturing, where it is used for cleaning wafers and equipment, as well as for etching and removing contaminants to ensure high-quality production. The presence of nanoparticles as small as 10 nm can affect yield and product integrity, making real-time detection essential.

Traditional optical-based technologies face challenges in detecting particles smaller than 20 nm due to refractive index limitations and interference from microbubbles, which can result in false or inconsistent readings. However, newer instrument technology, such as TSI’s Nano LPM™ System, addresses these issues by reliably detecting nanoparticles down to 10 nm, providing consistent, real-time insights to effectively monitor UPW quality.

Products

Nano LPM System

Provides true 10 nm nanoparticle detection in semiconductor ultrapure water (UPW). View Product