Vapor Process Gas (VPG) Filters

Ensuring Pure Vapor Delivery

In Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD), particulate contamination in the vapor stream can lead to devastating defects on the wafer. MSP Vapor Process Gas (VPG) Filters are engineered to provide a final barrier of defense, capturing ultrafine particles before they reach the process chamber. With high capture efficiency for nanometer-scale particles, these filters help maintain the purity of the precursor vapor, supporting the production of defect-free films.

Designed for Vacuum and Thermal Stability

Operating conditions in deposition systems can be harsh. VPG filters are designed to perform reliably under vacuum flow conditions and high temperatures. Their low pressure drop ensures minimal impact on process flow rates, while their robust thermal properties prevent degradation during operation. When heat-wrapped, these filters can also act as secondary heat exchangers, helping to ensure that any remaining liquid droplets are fully vaporized before entering the reactor, further protecting the process integrity.

optimizing System Performance

Beyond particle removal, VPG filters contribute to the overall stability of the vapor delivery system. By smoothing out flow irregularities and preventing condensation, they help create a consistent deposition environment. This stability is essential for achieving uniform film thickness and composition. Integrating MSP VPG Filters into your gas delivery lines is a proactive step towards optimizing tool performance, reducing maintenance intervals, and extending the lifespan of downstream components.