The Turbo™ Liquid Flow Controllers 2950 contain a custom engineered high-precision, high-speed flow sensor and meticulously designed flow control electronics to provide the world-class performance necessary for advanced semiconductor processing.
Precision Flow Control
The 2950 LFCs integrate flow sensors and liquid control electronics to regulate the Piezo valve on MSP’s Turbo II™ Vaporizers. For vaporizers lacking an onboard Piezo valve, consider the 2950V series Turbo™ LFC for effective flow control.
Applications
- Semiconductor thin film deposition processes
- Chemical vapor deposition (CVD)
- Plasma-enhanced chemical vapor deposition (PECVD)
- Atmoic layer deposituion (ALD)
- Metal-organic chemical vapour deposition (MOCVD)
- Applications with consistent flow rate requirements
Features and Benefits
- Fixed flow rate
- Exceptional accuracy and linearity
- Ultra-fast response time
- Superior repeatability
- Wide flow range options
Turbo™ LFC Models Available
| Model Number | TEOS Full Scale* (g/min) | TEMAZr Full Scale (g/min) | H2O Full Scale (g/min) | Request a Quote |
|---|---|---|---|---|
| 2950-002 | 0.2 | n/a | 0.14 | Request a Quote |
| 2950-01 | 1 | 0.19 | 0.73 | Request a Quote |
| 2950-05 | 5 | 0.95 | 3.6 | Request a Quote |
| 2950-10 | 10 | 1.9 | 7.3 | Request a Quote |
| 2950-20 | 20 | 3.8 | 14 | Request a Quote |
| 2950-30 | 30 | 5.7 | 21 | Request a Quote |
♦Nominal max flow determined using TEOS as reference liquid at 23±2°C. Flow rate range is a function of specified liquid.
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