Vaporizers
MSP’s Turbo II™ Vaporizers set a new standard in liquid-to-vapor conversion for Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Metal-Organic Chemical Vapor Deposition (MOCVD), and Plasma-Enhanced Chemical Vapor Deposition (PECVD) processes. Using advanced droplet vaporization and direct liquid injection (DLI), they deliver up to 200% more vapor output in half the footprint of previous designs - helping ensure stable, uniform vapor for higher quality thin films, improved wafer yields, and the ability to process even challenging precursors.
Precision Vapor Delivery for Demanding Applications
With a robust, clog-resistant design and low-temperature vaporization to minimize thermal decomposition, Turbo II™ Vaporizers offer exceptional stability, extended uptime, and lower operating costs. Ideal for semiconductor manufacturing, microelectronics, LEDs, protective coatings, nanoparticle synthesis, and more, they provide the precision, control, and flexibility to advance next-generation process development.
Unlocking the Power of Filters in CVD Defect ReductionDelve deeper into the art of reducing CVD defects by exploring our insightful white paper on the critical role of post-vaporization filtration. |