Vaporizers

Vaporizers are the backbone of gas phase processes, serving as the catalyst for converting liquids into essential gases. This transformative process is indispensable in a myriad of applications, ranging from precision thin film deposition to critical procedures like metal etching and doped epitaxial growth. Vaporizers find their versatile utility in various domains, including: MSP, a division of TSI®, offers a completely new line of Vaporizers for liquid source vaporization in gas-phase processing such as Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) used in semiconductor device fabrication and industrial coating applications.

CVD (Chemical Vapor Deposition)
PECVD (Plasma-Enhanced Chemical Vapor Deposition)
MOCVD (Metal-Organic Chemical Vapor Deposition)
ALD (Atomic Layer Deposition)

The Turbo II™ Vaporizer Difference
Twice the Output, Half the Size

MSP’s new Turbo II™ Vaporizers use a droplet vaporization, direct liquid injection (DLI) technique designed to meet modern demanding vaporization needs. This patented technology offers a broad range of advantages over older, more conventional techniques.

Inspired by breakthroughs in the science of droplet atomization and evaporation, these innovative vaporizers are half the physical footprint of earlier versions, while delivering a staggering 200 % increase in vapor output.

In thin film applications, the stable and uniform vapor leads to a higher quality thin film and higher wafer yields. The precision and control of the vaporizer makes it possible to vaporize difficult precursors, which were not usable before, opening up new areas for process development. The unique design provides highly reliable, stable operation resulting in less downtime and more money saved for users (low cost of ownership).

Features and Benefits

Extremely stable concentration output
Low temperature vaporization for minimized thermal decomposition risk
Longer mean time between repair (MTBR)
Ability to vaporize even the most challenging precursors
Direct liquid injection for on-demand vaporization
Enhanced potential for higher vapor concentration
Robust clog-resistant design

Applications Across Diverse Industries

Semiconductor Microelectronics
LEDs Optoelectronics
Protective Coatings
Nanoparticle Synthesis
Energy Production/Storage
Powder/Fiber Processing
Solar Photovoltaic
Medical Device
Bio Assays

Discover the Perfect Vaporizer for Your Needs

Utilize our user-friendly interactive product selector to pinpoint the optimal vapor delivery solution tailored to your CVD thin film application.

Explore Our Vaporizers

Unlocking the Power of Filters in CVD Defect Reduction

Delve deeper into the art of reducing CVD defects by exploring our insightful white paper on the critical role of post-vaporization filtration.

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High-Flow Turbo II Vaporizer 2855PE
MSP's Turbo II™ Vaporizer 2855PE is designed for high-precision microelectronic...

High-Flow Turbo II Vaporizer 2855NP
MSP's Turbo II™ Vaporizer 2855NP is designed for applications that require mid...

Low-Flow Turbo II Vaporizer 2852PE
MSP's Turbo II™ Vaporizer 2852PE is designed for high-precision microelectronic...

Low-Flow Turbo II Vaporizer 2852NP
MSP's Turbo II™ Vaporizer 2852NP is designed for applications that require low to...

Turbo Vaporizer 2821
The 2821 MSP Turbo™ Vaporizer is our highest liquid flow rate unit. This model features...