PRE Challenge Wafer Sets

PRE Challenge Wafer Sets provide dry depositions of NanoSilica™ or PSL particles, guaranteeing precise size distributions and compositions. These substrates are uniformly deposited, enabling consistent testing and tuning of your cleaning systems to ensure accurate performance assessments. Achieve uniform and reliable depositions crucial for validating the efficiency of your cleaning processes in semiconductor manufacturing, safeguarding against defects and optimizing productivity and yield.

Choose the Right Particle Suspension

NanoSilica™ and PSL offer concentrated suspensions of uniform particles for spatial evaluation. Process Particles™ simulate real-world contaminants, accurately assessing size-dependent PRE without introducing external contaminants into the cleanroom environment. Deposition is traceable to NIST for enhanced reliability and auditability.

Applications

• Research & Development: Develop new cleaning systems.
• Manufacturing/Production: Validate systems before shipment and during installation/qualification.
• Operations & Service: Revalidate systems throughout their lifespan or after maintenance.

Features and Benefits

• Dry deposition minimizes aging effects.
• Accurate and repeatable standards across batches.
• Wide range of substrates and particle types available.
• NIST-traceable particle suspensions ensure quality control.
• Cost-effective and shippable in triple-wrapped packaging.

Standard Wafer* Offering

*Common non-standard options: MSP provides substrates/carriers, 200 mm wafers, inspection summary, smaller/larger particle size, pellicles, multispot.

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