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Flow Rate 1 CFM (28.3 LPM) - 3.5 CFM (100 LPM) / Channel Sizes 0.3 µm to 10 µm,(6) user selectable channels. Check out series of Videos & Quick Tips here.

Process Particles™ Suspensions are used as particle material standards. They represent real-world contaminant particles encountered in semiconductor device fabrication processing.

High yields and minimal defects in semiconductor wafer production depend on effective cleaning systems. Proper validation ensures contaminants are removed, preserving wafer integrity throughout production.

Deposited particle size and count are controlled with precision, accuracy, and repeatability.

Vaporizers are used in gas phase processes to transition a liquid into a gas for thin film deposition or other processes that require a vapor.

Discover how a global semiconductor tool manufacturer overcame challenges in vaporizing TEMAZr and CpZr precursors crucial for ZrO₂ deposition.