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Process Particles™ Suspensions are used as particle material standards. They represent real-world contaminant particles encountered in semiconductor device fabrication processing.

This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 20 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom contamination standards. Manual loading...

Flow Rate 1 CFM (28.3 LPM) - 3.5 CFM (100 LPM) / Channel Sizes 0.3 µm to 10 µm,(6) user selectable channels. Check out series of Videos & Quick Tips here.

Discover how a global semiconductor tool manufacturer overcame challenges in vaporizing TEMAZr and CpZr precursors crucial for ZrO₂ deposition.

High yields and minimal defects in semiconductor wafer production depend on effective cleaning systems. Proper validation ensures contaminants are removed, preserving wafer integrity throughout production.

Vaporizers are used in gas phase processes to transition a liquid into a gas for thin film deposition or other processes that require a vapor.

Deposited particle size and count are controlled with precision, accuracy, and repeatability.