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Deposited particle size and count are controlled with precision, accuracy, and repeatability.

Flow Rate 1 CFM (28.3 LPM) - 3.5 CFM (100 LPM) / Channel Sizes 0.3 µm to 10 µm,(6) user selectable channels. Check out series of Videos & Quick Tips here.

Process Particles™ Suspensions are used as particle material standards. They represent real-world contaminant particles encountered in semiconductor device fabrication processing.

Vaporizers are used in gas phase processes to transition a liquid into a gas for thin film deposition or other processes that require a vapor.

High yields and minimal defects in semiconductor wafer production depend on effective cleaning systems. Proper validation ensures contaminants are removed, preserving wafer integrity throughout production.

Maintaining high purity gases is vital to avoid defects and ensure semiconductor quality. Best practices include real-time monitoring of particles as small as 2 nm and strict regulatory compliance.

Discover how a leading Japanese semiconductor supplier achieved unprecedented cleanliness in their manufacturing processes with TSI's revolutionary Water-based Condensation Particle Counter 3789 (WCPC).