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This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 20 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom contamination standards. Manual loading...

Flow Rate 1 CFM (28.3 LPM) - 3.5 CFM (100 LPM) / Channel Sizes 0.3 µm to 10 µm,(6) user selectable channels. Check out series of Videos & Quick Tips here.

Discover how a leading Japanese semiconductor supplier achieved unprecedented cleanliness in their manufacturing processes with TSI's revolutionary Water-based Condensation Particle Counter 3789 (WCPC).

Maintaining high purity gases is vital to avoid defects and ensure semiconductor quality. Best practices include real-time monitoring of particles as small as 2 nm and strict regulatory compliance.

Flow Rate 1 CFM (28.3 L/min) ±5% accuracy / Particle Size Range 0.100 to 10.0 µm

Flow Rate 0.1 CFM (2.83 L/min) ±5% accuracy / Particle Size Range 0.3 to 25 µm

MSP's Qual-Dep™ Reticle Qualification Contamination Standards are specifically designed to meet your exact tool qualification needs, providing reliable solutions for validating and aligning reticle inspection systems to ensure optimal performance and minimize risks in...

Poor testing can lead to low product quality and revenue loss. Using TSI particle counters enables real-time contamination detection, supporting process optimization and higher manufacturing efficiency.

Flow Rate 1 CFM (28.3 L/min) / Particle Size Range 0.3 to 25 μm / Integrated Pump

Flow Rate 1 CFM (28.3 L/min) / Particle Size Range 0.5 to 25 μm / Integrated Pump / VHP Option