Deposition Services

MSP, a Division of TSI, provides wafer and reticle contamination standards that support every stage of the semiconductor inspection system lifecycle—from development through qualification, calibration, and ongoing performance evaluation. Each contamination standard is produced with controlled particle size, composition, and count to deliver repeatable, traceable deposits that help maintain consistent tool performance throughout changing process needs.

• Dev-Dep™ Development Contamination Standards: Customized particle deposition tailored to represent real-world contamination scenarios and support tool and process development.
• Qual-Dep™ Qualification Contamination Standards: Tool-specific contamination standards designed to assist with performance checks prior to deployment and help reduce acceptance risk.
• Cal-Dep™ Calibration Contamination Standards: Traceable, repeatable calibration standards that support ongoing performance verification over time.
• PRE – Particle Removal Efficiency Testing: Challenge wafers with controlled particle deposits that allow users to assess wafer cleaning processes and refine cleaning steps as process requirements evolve.