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AeroTrak Handheld Particle Counter 9303

AeroTrak Handheld Particle Counter 9303

Flow Rate 0.1 CFM (2.83 L/min) / Particle Size Range 0.3 to 25 µm

Low-Flow Turbo II Vaporizer 2852NP

Low-Flow Turbo II Vaporizer 2852NP

MSP's Turbo II™ Vaporizer 2852NP is designed for applications that require low to mid vapor flow rates. Based off of the field proven, highly reliable, and low-maintenance MSP Turbo™ Vaporizers, the new 2852NP provides stable vapor concentrations while maintaining a very small...

AeroTrak Remote Particle Counter 7110

AeroTrak Remote Particle Counter 7110

Flow Rate 1.0 CFM (28.3 L/min) / Particle Size Range 0.100 to 10.0 µm

SPx-Calibration-Standards

SPx-Calibration-Standards

MSP's SPx Calibration Standards are precision engineered tools for the calibration, verification and re-qualification of the most common wafer surface inspection systems used in semiconductor manufacturing. These standards play a crucial role in ensuring the accuracy and...

Main Sources of Particle Shedding and Possible Impacts on Yield

Main Sources of Particle Shedding and Possible Impacts on Yield

Understanding the sources of particle shedding and impacts on yield is essential for effective mitigation strategies.

Turbo Vaporizer 2821

Turbo Vaporizer 2821

The 2821 MSP Turbo™ Vaporizer is our highest liquid flow rate unit. This model features 2400W of heater power and can be used to deliver flow rates up to 6000g/hr (TEOS or equivalent).

Prioritize Precision and Reliability for Maximum Safety in Aerospace and Defense

Prioritize Precision and Reliability for Maximum Safety in Aerospace and Defense

From the meticulous assembly of satellites and spacecraft to the intricate fabrication of composite materials for jet engines, every step demands seamless integration of cutting-edge technology and expert craftsmanship, based on precision and reliability. Avionics systems...

Achieve a Breakthrough in ALD Process for Cobalt Thin-Film Deposition

Achieve a Breakthrough in ALD Process for Cobalt Thin-Film Deposition

MSP transformed cobalt thin-film deposition for a global semiconductor giant struggling with CCTBA vaporization, including low vapor pressure and thermal instability, leading to clogging and downtime.

Boost Throughput in CVD & ALD by Reducing Liquid Waste

Boost Throughput in CVD & ALD by Reducing Liquid Waste

With its rapid response time and advanced feedback capabilities, the Turbo™ LFC is set to revolutionize CVD and ALD processes.


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