MSP’s Particle Deposition System sets industry standards for wafer inspection and metrology, supporting high yields in advanced device manufacturing. This system precisely and consistently deposits PSL spheres, NanoSilica™ Size Standards, and SiO2 particles, creating contamination standards with SI traceability for wafer inspection calibration. It also deposits particles from MSP Process Particles™ Suspensions, enabling accurate material characterization for inspection tool response to defects.
Products
Auto-Load 10 nm Particle Deposition System 2300G3A - 10 nm
Auto-Load 20 nm Particle Deposition System 2300G3A - 20 nm
Manual-Load 10 nm Particle Deposition System 2300G3M - 10 nm
Manual-Load 20 nm Particle Deposition System 2300G3M - 20nm
Manual-Load 30 nm Particle Deposition System 2300G3M – 30nm