Wafer and Reticle Contamination Standards

MSP, a Division of TSI, specializes in providing high-quality contamination standards for the semiconductor industry. Our services are designed to enhance the performance of your semiconductor manufacturing inspection systems, reduce inconsistencies within your inspection and metrology tools, and maximize device yield.

We supply certified contamination standards for both wafer and reticle inspection tools, ensuring consistent and repeatable control of particle size and count. Our contamination standards involve depositing specified particles of size, composition, and count onto your substrate of choice, including wafers, 6-inch reticles, and other substrates. We can deposit particles on bare, film, and patterned wafers ranging from 100mm to 300mm, supporting your development, qualification, calibration, and monitoring needs effectively.

Products

SPx Calibration Standards

MSP's SPx Calibration Standards are precision engineered tools for the calibration... View Product

Dev-Dep Development Reticle Contamination Standards

Reticle/photomask contamination standards consist of particles deposited on 6 inch reticles with... View Product

Dev-Dep Development Wafer Contamination Standards

Wafer contamination standards consist of particles deposited on a wafer (sizes from 100 mm to 450... View Product