MSP’s Particle Deposition System sets industry standards for wafer inspection and metrology, supporting high yields in advanced device manufacturing. This system precisely and consistently deposits PSL spheres, NanoSilica™ Size Standards, and SiO2 particles, creating contamination standards with SI traceability for wafer inspection calibration. It also deposits particles from MSP Process Particles™ Suspensions, enabling accurate material characterization for inspection tool response to defects.
Produkte
Auto-Load 20 nm Particle Deposition System 2300G3A - 20 nm
Manual-Load 20 nm Particle Deposition System 2300G3M - 20nm
Auto-Load 10 nm Particle Deposition System 2300G3A - 10 nm
Manual-Load 10 nm Particle Deposition System 2300G3M - 10 nm
Manual-Load 30 nm Particle Deposition System 2300G3M – 30nm
Reliable particle deposition is essential for high-quality microscopy and chemical analysis. Particle deposition systems enable researchers to deliver aerosols to substrates in a controlled, repeatable manner, producing samples that support confident interpretation. Whether the goal is a sparse distribution for single-particle analysis or uniform loading for averaged measurements, these systems provide the precision and flexibility needed in modern labs.
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Particle deposition systems help teams translate aerosol streams into high-quality samples, reducing rework, speeding analysis, and strengthening the link between particle characterization and downstream measurement techniques.