Particle Deposition Systems

MSP’s Particle Deposition System sets industry standards for wafer inspection and metrology, supporting high yields in advanced device manufacturing. This system precisely and consistently deposits PSL spheres, NanoSilica™ Size Standards, and SiO2 particles, creating contamination standards with SI traceability for wafer inspection calibration. It also deposits particles from MSP Process Particles™ Suspensions, enabling accurate material characterization for inspection tool response to defects.

Products

Auto-Load 10 nm Particle Deposition System 2300G3A - 10 nm

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Auto-Load 20 nm Particle Deposition System 2300G3A - 20 nm

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Manual-Load 10 nm Particle Deposition System 2300G3M - 10 nm

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Manual-Load 20 nm Particle Deposition System 2300G3M - 20nm

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Manual-Load 30 nm Particle Deposition System 2300G3M – 30nm

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