AVS 70th International Symposium and Exhibition

MSP, a Division of TSI®,  will be exhibiting at the AVS 70th International Symposium and Exhibition from November 3-8, 2024, in Tampa, Florida. We invite you to explore our advanced solutions for vaporization and liquid flow control designed for CVD and ALD processing.

Presentation Highlight

Kathy Erickson, Global Product Manager, will present her abstract titled “Reduce Liquid Waste and Improve Throughput in CVD and ALD Processing,” focusing on optimizing process efficiency in semiconductor manufacturing. It introduces the Turbo™ Liquid Flow Controller (LFC), a next-generation instrument designed for semiconductor processing. Unlike conventional LFCs with long stabilization times of 4-9 seconds, the Turbo LFC reaches ±1% of the set-point within just 0.3 seconds. This rapid response drastically reduces liquid waste and improves throughput, making it ideal for short pulse CVD and ALD processes. The Turbo™ LFC’s high-speed sensor enables tighter process control, providing greater precision and efficiency, and offering a more sustainable and cost-effective solution for gas-phase processing.

What We’re Showcasing

Turbo II™ Vaporizer

• Highly stable vapor flowrates: Achieve more repeatable results with stable processes.
• High flow rates: Increase deposition rates and throughput.
• Long lifetime: Lower your cost of ownership and reduce downtime.
• Contactless vapor delivery: Ideal for thermally sensitive and low vapor pressure liquids.

Turbo™ LFC

• Fast stabilization times: Shorten process times and reduce liquid waste.
• Highly accurate and stable: Ensure repeatability and process consistency.
• Change liquids without factory calibration: Accelerate R&D timelines with flexible liquid switching.
• Protection from environmental variability: Maintain stability for precise results.

Stop by our booth #424 to learn more about these solutions and how they can improve your manufacturing processes!