2026 UltraFacility Conference

Hear From TSI at UltraFacility 2026 Join TSI's Dan Troolin, Sr. Applications Engineer, for an in-depth look at the analytical technologies addressing today's most pressing contamination control challenges. Session: Measuring contamination from 2 to 15 nm to characterize UPW and UPW filters Day / Time: Coming Soon! Sub-10nm dissolved contaminants — namely ions and macromolecules — are a growing yield threat as node sizes shrink and detecting them in real time has been difficult. This presentation introduces an approach that helps: spray-drying coupled with differential mobility sizing and condensation particle counting, provides continuous insight into dissolved polymers down to the ppt range, upstream of point of use in UPW systems. It also supports liquid filter evaluation in the sub-15nm range per SEMI C79, helping engineers identify contamination before it reaches the wafer.

TSI Featured in UltraFacility Insights This must-read article "Filling the UPW Monitoring Gap" featured in UltraFacility Insights, examines why legacy liquid particle counters fall short for modern semiconductor fabs and how the TSI Nano LPM™ System addresses the sub-20 nm detection gap outlined in SEMI F63. It covers key monitoring locations, measurement methodology, and real-world applications for process control. Read the Article

TSI at UltraFacility 2026: Bronze Sponsor, Speaker, and Exhibitor

TSI is proud to return to UltraFacility 2026 as a Bronze Sponsor, Exhibitor, and Speaker. Visit our booth to see the TSI Nano LPM™ System and connect with our contamination control specialists.

Visit TSI at the Exhibition Hall

Stop by the TSI booth to see the TSI Nano LPM™ System. Our team will walk you through how this technology is helping process engineers and quality managers detect contamination that legacy liquid particle counters miss, addresseing the critical metrology gap in ultrapure water monitoring.

Why the TSI Nano LPM™ System?

Unmatched Sensitivity

Down to 10 nm, the Nano LPM™ System delivers reliable detection of both suspended nanoparticles and dissolved content. Built for modern semiconductor fabs, it offers the linear, matching, and repeatable performance that demanding process environments require.

Empowers Data-Driven Decisions

Your team can respond to excursions faster, optimize filtration maintenance schedules, and distinguish subtle quality differences across polish stages before they affect yield. Real-time, continuous monitoring provides actionable data on UPW quality at the main supply and points-of-use. 

Advanced Aerosolization Technology

A specialized generator aerosolizes and dries UPW to isolate contaminants, which are then analyzed by a cleanroom-ready, water-based CPC for accurate, dependable measurements. The system leverages TSI's decades of leadership in aerosolization and condensation particle counting (CPC).

Learn More About the TSI Nano LPM™ System >

About TSI

Founded in 1961, TSI Incorporated is a global leader in precision measurement instrumentation, software services, and workflow management. With more than six decades of expertise, TSI contributes to the development of industry standards and delivers solutions that help researchers, engineers, and manufacturers make informed, data-driven decisions.

TSI's contamination control portfolio for semiconductor and cleanroom applications includes:

• TSI Nano LPM™ System: Detects nanoparticles and dissolved content down to 10 nm in semiconductor UPW. Combines a Nano LPM Aerosol Generator with a water-based CPC to close the critical metrology gap in UPW monitoring.

• 0.1 Micron Airborne Particle Counters (Remote Particle Counter | Portable Particle Counter): Designed to detect airborne particles in cleanroom environments, supporting rigorous air quality standards in semiconductor fabs.

• 10 nm Cleanroom Water-Based CPC: Built for cleanroom use, this condensation particle counter delivers sensitive, stable detection of nanoparticles in controlled environments.

Explore Our Full Portfolio of Cleanroom Monitoring Tools >