New Turbo II™ Vaporizers

Experience higher throughput, lower waste, and superior stability with the new MSP™ Turbo II™ Vaporizers. Designed for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD), these vaporizers redefine liquid source vaporization for semiconductor fabrication and industrial coating applications.
 

Better Vaporization, More Process Options

200% More Throughput, 50% Smaller
The Turbo II™ Vaporizers deliver higher vapor concentrations, enabling faster deposition and etch rates, while their compact design reduces the heat exchanger size by 50%.

Highly Stable, Precision-Controlled Vapor Delivery
These Vaporizers ensure consistent vapor flow rates for repeatable, high-quality results, making them ideal for sensitive processes like PECVD.

Longer Lifetime, Lower Maintenance
They are designed to last the lifetime of your system, minimizing operational issues and reducing ownership costs.

Works with Difficult & Low Vapor Pressure Liquids
Turbo II™ Vaporizers prevent thermal decomposition with unheated liquid delivery and efficiently vaporize a wide range of precursors for flexible processing.

Advanced Droplet Vaporization & DLI Technology
The Turbo II™ Vaporizers deliver higher wafer yields and better thin film uniformity while improving deposition consistency and process efficiency.

 

Upgrade Your Vaporization Process - Contact Us Today!

Don't miss your chance to revolutionize your CVD and ALD processes with the MSP Turbo II™ Vaporizers. Expand your liquid processing options and build deposition systems that have more capability, stability and reliability. Fill out the form below to request your new Turbo II™ Vaporizer and elevate your process module to the next level!