Lithography Process Optimization for Masks
Surface defect inspection for masks ensures high-quality lithography by detecting and addressing imperfections. Advanced inspection systems improve yield and efficiency in semiconductor manufacturing.
Process Particles Suspensions
Process Particles™ Suspensions are used as particle material standards. They represent real-world contaminant particles encountered in semiconductor device fabrication processing.
Manual-Load 20 nm Particle Deposition System 2300G3M - 20nm
This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 20 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom contamination standards. Manual loading...
AeroTrak-Plus Portable Particle Counter A100 Series
Flow Rate 1 CFM (28.3 LPM) - 3.5 CFM (100 LPM) / Channel Sizes 0.3 µm to 10 µm,(6) user selectable channels. Check out series of Videos & Quick Tips here.
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