Dev-Dep Development Reticle Contamination Standards
Reticle/photomask contamination standards consist of particles deposited on 6 inch reticles with the industry's best particle size and count control. These certified standards for reticle inspection tools are totally customized for each customer.
Dev-Dep Development Wafer Contamination Standards
Wafer contamination standards consist of particles deposited on a wafer (sizes from 100 mm to 450 mm) with the industry's best particle size and count control. These certified standards for wafer inspection tools are totally customized for each customer.
PRE Challenge Wafer Sets
PRE Challenge Wafers are an affordable solution for Particle Removal Efficiency (PRE) testing resulting in reliable cleaning system validation.
Lithography Process Optimization for Masks
Surface defect inspection for masks ensures high-quality lithography by detecting and addressing imperfections. Advanced inspection systems improve yield and efficiency in semiconductor manufacturing.
Manual-Load 10 nm Particle Deposition System 2300G3M - 10 nm
This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom contamination standards. Manual loading...
VPG-A6 Inline Filter
Ultra-high efficiency filtration down to 2 nm and below.The industry leading VPG-A6 Vapor Process Gas filter is an ultralow pressure drop, ultra-high efficiency in-line filter designed for vapor and process gas filtration. This patent-protected 316L SS filter is chemically...
PRE Challenge Photomask Sets
PRE Challenge Photomasks offer a cost-effective solution for Particle Removal Efficiency (PRE) testing, ensuring dependable validation of cleaning systems.
78 results found