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Real-time monitoring ensures compliance, aids in root cause analysis, and supports continuous improvement, enhancing overall operational efficiency and regulatory adherence.

Continuing to use wafers with unknown performance introduces risk. Our recertification service provides NIST-traceable verification of your contamination wafers.

Reticle/photomask contamination standards consist of particles deposited on 6 inch reticles with the industry's best particle size and count control. These certified standards for reticle inspection tools are totally customized for each customer.

Flow Rate 0.1 CFM (2.83 L/min), 1 CFM (28.3 L/min) / Channel Sizes 0.2 to 25 μm

Explore the crucial yet often overlooked realm of photomask contamination standards in semiconductor manufacturing.

Wafer contamination standards consist of particles deposited on a wafer (sizes from 100 mm to 450 mm) with the industry's best particle size and count control. These certified standards for wafer inspection tools are totally customized for each customer.

PRE Challenge Wafers are an affordable solution for Particle Removal Efficiency (PRE) testing resulting in reliable cleaning system validation.

MSP's Particle Removal Efficiency (PRE) standards optimize cleaning, alerting when attention needed to avoid contamination-related losses.

Surface defect inspection for masks ensures high-quality lithography by detecting and addressing imperfections. Advanced inspection systems improve yield and efficiency in semiconductor manufacturing.