Search

The 1nm SMPS™ enhances material science by enabling precise nanoparticle characterization and real-time monitoring during synthesis, driving innovation in various applications.

PRE challenge wafers help semiconductor manufacturers validate and optimize wafer cleaning processes, improving yields, and ensuring reliable particle removal.

Photomask contamination standards ensuring accurate defect detection and optimized processes.

Fireworks cause a sharp increase in ultrafine particles, exceeding air quality limits. Even without direct exposure, they impact air quality and pose health risks.

Aerosol neutralizers are an essential piece of many aerosol research studies because aerosol particles dispersed by nebulization, combustion, or powder dispersion are usually electrostatically charged.

Number-based UFP measurements reveal more particles than mass-based methods, highlighting health risks. Mass-based methods often miss UFPs, making number-based techniques crucial for accurate monitoring.

For aerosol researchers, environmental and health professionals seeking accurate ultrafine particle (UFP) counts and concentration measurements, the OmniCount™ Portable Water-based Condensation Particle Counter (PWCPC) Model 3002 provides a versatile, portable, and cost...

This fully automated particle deposition system deposits PSL and SiO2 spheres as small as 20 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom 300 mm and 200 mm contamination standards....

This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 30 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom contamination standards. Manual loading...

Ammonia (NH3) Module for TSI OmniTrak™ Solution.This product is only available in the US, Canada, United Kingdom, European Union, Switzerland, Norway and Australia.