Understanding Particle Removal Efficiency (PRE) in Wafer Cleaning Processes

Particle Removal Efficiency (PRE) is a critical metric in the process of maintaining effective cleaning protocols, helping manufacturers evaluate and optimize how effectively cleaning systems remove contaminants from wafer surfaces. Achieving high PRE is increasingly important as device structures become smaller and more complex, where even the tiniest particles can impact performance and reduce product quality.

Tools for Consistent PRE TestingMSP, a Division of TSI®, offers an affordable solution with our Challenge Wafers and Photomasks for Particle Removal Efficiency (PRE) Testing.

To measure PRE, semiconductor facilities often use challenge wafers, which are pre-deposited with uniform particles of known composition and size. These challenge wafers enable facilities to test their cleaning systems with consistent benchmarks, helping identify areas for improvement. By using standardized particles—such as NanoSilica™ or specialized Process Particles—on these wafers, manufacturers can track cleaning performance over time, ensuring that systems meet quality standards.

Benefits of Reliable PRE Testing

Reliable PRE testing directly contributes to higher yields and smoother production flows. When facilities have consistent PRE benchmarks, they can reduce the likelihood of contaminants affecting device performance. This proactive approach helps minimize production delays and costly disruptions by ensuring that cleaning systems are functioning optimally.

Expert Support for Optimized Performance

Choosing the right type of challenge wafer is crucial for accurate PRE testing. Selecting particles that closely mimic contaminants in the actual production environment allows for more effective evaluation. Many suppliers offer guidance in choosing the appropriate wafer recipe for each application, supporting users in achieving optimal cleanliness levels.

Applications Across Semiconductor Production

PRE challenge wafers play a valuable role across all stages of semiconductor production, from research and development to full-scale manufacturing. They are used not only to validate existing cleaning processes but also to guide the development of new systems. With reliable PRE metrics, semiconductor companies can continuously improve cleaning protocols, ensuring that they meet evolving industry standards and product requirements.

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