This website uses cookies
Die Website speichert nun nur noch wichtige Cookies auf Ihrem Computer. Wenn Sie keine Cookies zulassen, können Sie möglicherweise bestimmte Funktionen der Website nicht nutzen, wie zum Beispiel: Anmelden, Produkte kaufen, personalisierte Inhalte ansehen, zwischen den Sprachen der Website wechseln. Es wird empfohlen, dass Sie alle Cookies zulassen.
+49 241 52 30 30 (DE) Alle Standorte

SUCHEN

NanoSilica Size Standards

*Diese Seite ist leider nur in Englisch verfügbar.*

MSP’s NanoSilica™ Size Standards are concentrated suspensions of amorphous SiO2 particles with highly uniform size distributions, suspended in ultra-pure water (UPW). NanoSilica Size Standards are available in 26 nominal sizes ranging from 15 to 200 nm, with size distributions narrower than commercially available PSL spheres. They’re provided in 5-mL quantities in dropper-tip bottles for convenience when mixing suspensions. All NanoSilica standards come with a Certificate of Calibration and Traceability and a Safety Data Sheet with handling and disposal instructions.

Silica is the material of choice for calibrating high-sensitivity inspection systems with intense DUV light sources because they are stable under exposure to DUV radiation. PSL (polystyrene latex) absorbs DUV radiation and volatilizes, so PSL spheres shrink upon inspection.

While our NanoSilica Size Standards are well suited for use in MSP Particle Deposition Systems and other particle deposition tools, they’re also excellent for calibrating DMAs, optical (laser) particle counters and other particle instruments.  With a lower refractive index than PSL, they’re more representative of real-world particles.

Features and Benefits

  • Extremely uniform size distribution
  • Modal diameter measured with SI traceability
  • Symmetric size distributions
  • Stable when subjected to intense DUV radiation
  • High particle number concentration
  • Easy to use
  • Stable dilutions

Applications

  • Wafer and reticle (photomask) inspection tool calibration
  • Inspection tool development and qualification
  • Incoming bare wafer inspection/qualification
  • Blanket film monitoring
  • Incoming reticle (photomask) inspection/qualification
  • Production reticle (photomask) monitoring
  • Process tool qualification and monitoring
  • Particle counter calibration
Model Description Certified Modal Diameter [nm] Approx. Size Dist. Width, RFW HM
All NanoSilica model numbers begin with 2260-02      
1044add to cart NS-0015A 15 nm 5 mL 14-16 13%
1046add to cart NS-0018A 18 nm 5 mL 17-19 12%
1047add to cart NS-0020A 20 nm 5 mL 19-21 11%
1048add to cart NS-0024A 24 nm 5 mL 23-25 10%
1075add to cart NS-0027A 27 nm 5 mL 26-28 9%
1049add to cart NS-0030A 30 nm 5 mL 29-31 8%
1079add to cart NS-0032A 32 nm 5 mL 31-33 7%
1062add to cart NS-0035A 35 nm 5 mL 34-36 6%
1076add to cart NS-0037A 37 nm 5 mL 36-38 6%
1051add to cart NS-0040A 40 nm 5 mL 39-41 6%
1063add to cart NS-0045A 45 nm 5 mL 44-46 5%
1052add to cart NS-0050A 50 nm 5 mL 49-51 5%
1077add to cart NS-0055A 55 nm 5 mL 53-57 5%
1053add to cart NS-0060A 60 nm 5 mL 58-62 4%
1067add to cart NS-0064A 64 nm 5 mL 63-65 4%
1054add to cart NS-0070A 70 nm 5 mL 68-72 4%
1068add to cart NS-0074A 74 nm 5 mL 73-75 4%
1055add to cart NS-0080A 80 nm 5 mL 78-82 4%
1069add to cart NS-0084A 84 nm 5 mL 83-85 4%
1057add to cart NS-0090A 90 nm 5 mL 88-92 4%
1070add to cart NS-0094A 9 4nm 5 mL 93-95 4%
1058add to cart NS-0100A 100 nm 5 mL 95-105 4%
1071add to cart NS-0104A 104 nm 5 mL 102-106 4%
1059add to cart NS-0125A 125 nm 5 mL 120-130 4%
1060add to cart NS-0150A 150 nm 5 mL 145-155 4%
1061add to cart NS-0200A 200 nm 5 mL 190-210 4%