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Liquid Flow Controllers Without Valves 2950

Model Number: 2950-01

Built upon field proven technology, the MSP Turbo™ Liquid Flow Controllers 2950 were engineered to pair with MSP Turbo II™ Vaporizers to provide a reliable, high-performance liquid vapor delivery solution for semiconductor thin film deposition processes (including CVD, PECVD, ALD, and MOCVD).

Product Details

The Turbo™ Liquid Flow Controllers 2950 contain a custom engineered high-precision, high-speed flow sensor and meticulously designed flow control electronics to provide the world-class performance necessary for advanced semiconductor processing.

Precision Flow Control

The 2950 LFCs integrate flow sensors and liquid control electronics to regulate the Piezo valve on MSP’s Turbo II™ Vaporizers. For vaporizers lacking an onboard Piezo valve, consider the 2950V series Turbo™ LFC for effective flow control.

Applications

  • Semiconductor thin film deposition processes
    • Chemical vapor deposition (CVD)
    • Plasma-enhanced chemical vapor deposition (PECVD)
    • Atmoic layer deposituion (ALD)
    • Metal-organic chemical vapour deposition (MOCVD)
  • Applications with consistent flow rate requirements

Features and Benefits

  • Fixed flow rate
  • Exceptional accuracy and linearity
  • Ultra-fast response time
  • Superior repeatability
  • Wide flow range options

Turbo™ LFC Models Available

Model Number TEOS Full Scale* (g/min) TEMAZr Full Scale (g/min) H2O Full Scale (g/min) Request a Quote
2950-002 0.2 n/a 0.14 Request a Quote
2950-01 1 0.19 0.73 Request a Quote
2950-05 5 0.95 3.6 Request a Quote
2950-10 10 1.9 7.3 Request a Quote
2950-20 20 3.8 14 Request a Quote
2950-30 30 5.7 21 Request a Quote

Nominal max flow determined using TEOS as reference liquid at 23±2°C. Flow rate range is a function of specified liquid.

Related Resources

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