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Develop the Next Breakthrough

Liquid Vaporizers, Filters, and Liquid Flow Controllers for CVD/ALD Thin Film Deposition

MSP’s Liquid Source Vapor Delivery Solutions

MSP Turbo™ Vaporizers

Develop the Next Breakthrough

Used world-wide, MSP Turbo™ Vaporizers transitions liquids into gases so they can be used for gas phase processes. This vapor deposition tool is ideal for any application which requires a high quality, stable vapor. They are used primarily in thin film deposition by:

  • CVD (Chemical Vapor Deposition)
  • PECVD (Plasma-Enhanced Chemical Vapor Deposition)
  • MOCVD (Metal-Organic Chemical Vapor Deposition)
  • ALD (Atomic Layer Deposition)
  • Epi (Epitaxial Growth)

Additionally, our vapor deposition tool provides very uniform thin films for diamond-like coatings (DLC) and SiC-based applications.

This direct liquid injection vaporizer (DLI Vaporizer) uses a droplet atomization technique. The design of the MSP Turbo™ Vaporizer design applies advanced aerosol science and thermo-dynamics to create a more precise solution for liquid source vaporization.

While other liquid source bubblers have difficulty vaporizing thermally sensitive liquids or liquids with low vapor pressure, the MSP Turbo™ Vaporizer successfully vaporizes them with a very stable concentration output and easily adjustable liquid flow rates. It also features a wider process window, producing lower and higher vapor concentrations than other vaporizers.

Our Performance Enhanced (PE) Turbo-Vaporizers provide even higher performance and increased precision to vaporize your liquid precursors. It:

  • Reduces atomized droplet size
  • Increases thermal efficiency
  • Reduces response time
  • Eliminates liquid bubble formation
  • Increases process options
  • Lowers maintenance costs
  • Reduces downtime

MSP’s vapor delivery systems more completely vaporize your liquid precursors, leading to more uniform thin film depositions, denser films, and films with more resistance to plasma-induced damage. Our systems are able to vaporize liquid precursors that are too difficult to vaporize by other methods (such as thermally sensitive materials, and materials with low vapor pressure) - including CCTBA, TEMAZr and TEMAHf molecules. To read more about optimizing your liquid source vaporization, take a look at our white paper.

MSP’s Vapor Delivery Solutions Family

MSP, a division of TSI, provides unique, innovative solutions for vapor delivery. Our liquid delivery system products are primarily used as components or accessories for CVD, PECVD, MOCVD, and ALD systems.

MSP DLI Vaporizer MSP Vapor Deposition Filters MSP CVD and ALD Liquid Flow Controllers
DLI Vaporizers
Vapor Process Gas Filters
Liquid Flow Controllers

Highly precise, reliable vapor delivery devices enabling efficient processes, even with difficult to use liquids.

  • Low heat vaporization
  • Long-term stable operation
  • Wide process window
  • Clog-resistant design

The unique design of these filters provides extremely low pressure drop—a must for low pressure processes.

  • Extremely low pressure drop
  • Ultra-high efficiency
  • 100% stainless 316 steel construction

MSP’s Liquid Flow Controllers were developed specifically for ALD & CVD applications.

  • Extremely fast response time
  • Self-learning, leading to improved control
  • Zoned PID values providing multiple set-points with optimal control

 

Find your Vapor Delivery Solution

Use our interactive product selector to find the right vapor delivery solution for your CVD thin film application.

Launch Product Selector

 

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Please note MSP provides vaporizers, filters, and liquid flow controllers. We do not provide fully assembled CVD equipment/machines.