MSP Semiconductor Metrology

Today's Standards for Tomorrow's Yield

Particle Deposition Systems     |     Contamination Standards​     |     Particle Standards​

Offering deposition equipment, services, and particle suspensions, MSP provides a full suite of particle deposition and metrology products.

Particle Deposition Systems

Enabling Tomorrow’s SSIS Calibration Standards Today

The advanced 2300G3 Particle Deposition System sets the standards for wafer inspection and metrology equipment that will help increase yield of leading-edge devices for years to come, yet this complete system can be used now to meet today’s measurement needs, including:

• Traceable inspection system calibration
• Matching legacy wafer calibration standards
• Incoming bare wafer inspection/qualification
• Determining inspection sensitivity for proprietary films
• Blanket film monitoring
• Inspection tool development and qualification
• Process tool qualification, process learning, and monitoring

Contamination Standards

Improving Your Surface Inspection Vision

MSP provides certified Wafer and Reticle Contamination Standards for calibrating, qualifying, and monitoring wafer and photomask (reticle) inspection systems. Particles of specified size, composition, and count are deposited on a bare silicon wafer or your substrate of choice, including wafers, HDD disks, or photomasks (any type). Particles can be deposited on bare, film, and patterned wafers from 100mm to 450mm.

MSP is a leader in the industry, providing advanced technology to cover customers’ particle/calibration needs, including:

• Commercial particle deposition technology (having worked with top-tier companies for over 20 years)
• Surface inspection system contamination standards
• Particle suspensions (NanoSilica™ Size Standards, Process Particles™ Suspensions)

Particle Standards

Calibrate your Surface Scanning Equipment

Particle Standards are used to produce high-quality contamination standards for calibrating, qualifying, and monitoring the performance of wafer and photomask inspection systems.

NanoSilica^TM Size Standards

MSP’s NanoSilica^TM Size Standards are concentrated suspensions of amorphous SiO2 particles with highly uniform size distributions, suspended in ultra-pure water (UPW). NanoSilica Size Standards are available in 24 nominal sizes ranging from 15 to 200 nm, with size distributions narrower than commercially available PSL spheres.

Process Particles^TM Suspensions

Process Particle^TM Suspensions are used as particle material standards, representing real-world contaminant particles encountered in semiconductor device fabrication processing. Deposition of these particles on wafers and reticles enables characterization of the material-dependent response of a surface inspection system when accurate particle size or particle sphericity are of secondary importance. They consist of broad size distributions of irregularly shaped solid particles suspended in ultra-pure water (UPW).

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