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When you imagine a more efficient and effective way to get the most from your chip manufacturing, MSP is leading the cutting edge of semiconductor vaporization technology.

MSP, a division of TSI, offers a complete line of vaporization products for liquid source vaporization in gas-phase processing, such as:

  • Chemical Vapor Deposition (CVD)
  • Atomic Layer Deposition (ALD)

Turbo Vaporizers

Our products are used in semiconductor device fabrication and industrial coating applications. Our line of MSP® Turbo™ Vaporizers use a droplet vaporization, direct liquid injection (DLI) technique designed to meet modern demanding vaporization needs.

MSP's exclusive technology offers a broad range of advantages over older, more conventional techniques. The MSP® Turbo™ Vaporizer applies advanced technology from aerosol science and thermo-dynamics to create a more refined solution to vaporization. In thin film applications, the stable and uniform vapor leads to a higher quality thin film and higher wafer yields.Turbo LFC

The precision and control of our clog-resistant vaporizer makes it possible to vaporize difficult precursors, which were not usable before, opening up new areas for process development. The unique design provides longer, stable operation resulting in less down time and more money saved for users.

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Process Gas Filters

In addition to vaporizers, MSP also offers vapor process gas filters and liquid flow controllers.

MSP's chemically and thermally resistant vapor/gas filters are specifically designed for low pressure and high temperature applications, providing reliable filtration even for chemically aggressive vapors/gases. The filters are designed to have extremely low pressure drops, making it easier to work in an ultra-low pressure environment. Pump down is faster, and lower pressures are possible.

Liquid Flow Controllers

Our versatile liquid flow controllers can be used to control the on-board liquid controller in PE vaporizers. It can be used to maintain a steady liquid flow, or to generate repeatable short duration vapor pulses for ALD applications.