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Meet Tomorrow's Challenges with Nanoscale Expertise
When you know what you need to design or validate your inspection equipment to increase yield, MSP, a division of TSI, will provide calibration standards that no one else can provide.
Offering particle deposition equipment, services, and particle suspensions, MSP provides a full suite of particle deposition and metrology products.
The advanced 2300G3 Particle Deposition System sets the standards for wafer inspection and metrology equipment that will help increase yield of leading-edge devices for years to come, yet this complete system can be used now to meet today’s measurement needs.
MSP provides certified Wafer and Reticle Contamination Standards for calibrating, qualifying, and monitoring wafer and photomask inspection systems. Particles of specified size, composition, and count are deposited on a bare silicon wafer or your substrate of choice, including wafers, photomasks/reticles (any type), and HDD disks. Particles can be deposited on bare, film, and patterned wafers from 100 mm to 300 mm.
MSP is a leader in the industry, providing advanced technology to cover customers’ particle/calibration needs.
Whether testing for particle size, count, or composition, it is imperative to use reliable particle suspensions to calibrate your surface scanning equipment or particle counters. A particle standard consists of a specific size range and number concentration of solid particles suspended in ultra-pure water (UPW). This suspension is dispersed into clean air or nitrogen and deposited onto wafers and reticles in specific patterns and sizes.
Particle Standards are used to produce high-quality contamination standards for calibrating, qualifying, and monitoring the performance of wafer and photomask inspection systems.