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AVS 19th International Conference on Atomic Layer Deposition ALD 2019

Jul 21 2019 - Jul 24 2019 Hyatt Regency Bellevue, 900 Bellevue Way NE, Bellevue, WA 98004 402

Join us at the AVS 19th International Conference on Atomic Layer Deposition ALD 2019ALD 2019, the 19th International Conference on Atomic Layer Deposition, incorporates the Atomic Layer Etching 2019 Workshop (ALE 2019). This 3-day event is "dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching" and focuses on semiconductor manufacturing and processing.

TSI subsidiary, MSP Corporation, will exhibit at #ALD2019. MSP's Turbo-Vaporizer transitions liquids into gases so they can be used for gas phase processes. This vapor deposition tool is ideal for any application which requires a high quality, stable vapor. They are used primarily in thin film deposition by:

  • CVD (Chemical Vapor Deposition)
  • PECVD (Plasma-Enhanced Chemical Vapor Deposition)
  • MOCVD (Metal-Organic Chemical Vapor Deposition)
  • ALD (Atomic Layer Deposition)

Learn more about MSP Turbo-Vaporizers