Manual-Load 30 nm Particle Deposition System 2300G3M – 30nm
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This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 30 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom wafer calibration standards. Manual loading allows a wide range of substrates to be deposited including 150 mm, 200 mm, and 300 mm wafers, supporting of all of your wafer metrology applications and improving product yield.