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Reticle Inspection Standards

Reticle (Photomask) Deposition Calibration Standards*Merci de noter que cette page est disponible en anglais uniquement.*

Characterize and optimize the sensitivity and overall performance of your reticle inspection system with Reticle (Photomask) Deposition Calibration Standards from MSP. These high-quality calibration standards are made to your specifications with quick turnaround, enabling short learning cycles during tool development and providing timely quality assurance for installed systems.

MSP Reticle (Photomask) Deposition Calibration Standards consist of particles deposited on a 6-inch reticle with the industry's best particle size and count control. Using the advanced particle generation and DMA technology of MSP's Particle Deposition Systems, the modal diameter of deposited nanoparticles is controlled with nanometer-level accuracy and sub-nanometer resolution.

Reticle (Photomask) Deposition Calibration StandardsEvery substrate is handled with extreme care and packaged with MSP's signature triple-wrap packaging, preventing contamination during transport.

Deposit Patterns

Particles can be deposited in Spot, Full (Blanket), Arc, and Ring patterns.

Particle Materials/Types

Particle size standards available for deposition include spheres of PSL (polystyrene latex) and SiO2 (including MSP NanoSilica™ Size Standards). MSP Process Particles™ Suspensions are currently offered in 13 materials for deposition.

Reticle Inspection Standard Base Items

The Reticle Deposition Calibration Standard includes a base item, which consists of one deposit on a reticle. Customers typically provide the reticle of their choice (blank, coated, patterned, optical, EUV), but MSP also provides optical photomask blanks.

The base item includes a Deposition Summary, Certificate of Conformance, Certificate of Calibration for each particle size standard, and triple-wrap packaging.

Model Mask Calibration
Standard Description
Deposit
Pattern
Particle
Material
Particle Size*
5022request a quote Spot PSL Spot  PSL 20 nm to 1.6 µm
5023request a quote Spot SiO2, NanoSilica Spot SiO2 20 nm to 1.6 µm
5024request a quote Spot Si3N4 Spot Si3N4 20 nm to 1.6 µm
5035request a quote Spot Al203 Spot Al2O3 20 nm to 1.6 µm
5070request a quote Spot Process Particles Spot Process Particles 20 nm to 1. 6 µm
5083request a quote Spot Small Particles Spot SiO2 10 nm to <20 nm
5082request a quote Spot Large Particles Spot PSL, SiO2 >1.6 µm to 20 µm
5025request a quote Full PSL Full PSL 20 nm to 1.6 µm
5026request a quote Full SiO2, NanoSilica Full SiO2 20 nm to 1.6 µm
5027request a quote Full Si3N4 Full Si3N4 20 nm to 1.6 µm
5056request a quote Full Small Particles Full SiO2 10 nm to <20 nm
5053request a quote Full Large Particles Full PSL, SiO2 >1.6 µm to 20 µm 

* Range of particle size available for the indicated item. Particle size standards are only available in discrete sizes.

Additional Deposits

Individual deposits can be added to the base item to create a Reticle Deposition Calibration Standard with virtually any number of particle deposits.

Model Additional
Deposition Description
Deposit
Pattern
Particle
Material
Particle Size*
5044request a quote Additional Spot PSL Spot  PSL 20 nm to 1.6 µm
5045request a quote Additional Spot SiO2, NanoSilica Spot SiO2 20 nm to 1.6 µm
5046request a quote Additional Spot Si3N4 Spot Si3N4 20 nm to 1.6 µm
5051request a quote Additional Spot Al203 Spot Al2O3 20 nm to 1.6 µm
5078request a quote Additional Spot Process Particles Spot Process Particles  20 nm to 1.6 µm
5057request a quote Additional Spot Small Particles Spot SiO2 10 nm to <20 nm
5055request a quote Additional Spot Large Particles Spot PSL, SiO2 >1.6 µm to 20 µm 

* Range of particle size available for the indicated item. Particle size standards are only available in discrete sizes.

Witness Wafers

To validate deposition processing of a reticle, we typically deposit particles on a 'Witness Wafer' before depositing on the reticle using the same deposition recipe. The Witness Wafer (200 mm or 300 mm) is inspected using a Scanning Surface Inspection System (SSIS) with ~35nm sensitivity (KLA Surfscan SP2).

Each Witness Wafer comes with a Deposition Summary, which includes SSIS inspection results (Report Only). At additional cost, the Witness Wafer can be shipped to the customer (Report & Ship).

For particle size <60 nm (PSL light-scattering-equivalent), a 300 mm Witness Wafer is recommended because 300 mm wafers generally have lower background counts at small sizes and provide better signal-to-noise than 200 mm wafers. For larger particle sizes, 200 mm wafers are more cost-effective.

Model Witness Wafer Description Wafer Size Report Ship
5014request a quote 200 mm SSIS Report Only 200 mm X  
5076request a quote 200 mm w/SSIS Report - Ship  200 mm X X
5020request a quote 300 mm SSIS Report Only 300 mm X  
5075request a quote 300 mm w/SSIS Report - Ship 300 mm X X

 

Features and Benefits

  • Widest range of particle materials and sizes
  • Over 100 particle size standards available
  • Customizable deposit patterns and locations
  • Particle size control with nanometer-level accuracy for nanoparticles
  • Consistent particle size with sub-nanometer resolution for nanoparticles
  • Particle count from 100 to millions per recipe
  • Quick turnaround for faster learning
  • Triple-wrap packaging for low-adder transport

Applications

  • Reticle (photomask) inspection tool calibration
  • Inspection tool development and qualification
  • Incoming reticle (photomask) inspection/qualification
  • Production reticle (photomask) monitoring