This website uses cookies
该网站现在只在您的计算机上存储必要的cookies。如果您不允许使用cookie,您可能无法使用网站的某些功能,包括但不限于:登录,购买产品,查看个性化内容,切换网站语言。建议您允许所有的Cookie。

搜索

Vaporization Solutions

Microelectronics are everywhere – from the cars we drive, to the phones we use, to the computers we work from. Advancements in semiconductor manufacturing drives innovation in microelectronics – safer cars with sophisticated sensor networks, more functional cell phones, and faster, lighter computers. These advanced semiconductor manufacturing processes produce state-of-the art logic and memory devices that help us be more effective in our everyday life, drive efficiencies, and lay the foundation for innovation. They are the framework for safer systems: from smart automobiles to smart factories to smart homes.

Vaporizers are a critical component in semiconductor fabrication. Manufacturing microelectronic devices require hundreds of process steps including multiple thin film layers made of different materials. CVD (Chemical Vapor Deposition) and ALD (Atomic Layer Deposition) are two widely used methods to create thin films. CVD & ALD are gas phase processes. When CVD or ALD chemistry requires the use of a material that is typically in liquid form, a vaporizer is used to phase-change the liquid into a gas.

MSP, a Division of TSI, provides leading technology tools to vaporize liquid precursors for thin film deposition or other processes like gas-phase metal etch or doped epitaxial growth. We are a leader in the semiconductor vaporization market, providing higher quality vapors which can lead to improved thin films, wider process windows, higher achievable vapor concentrations, and less risk of thermal decontamination of decreased downtime.

MSP provides three key components of a vaporization system: vaporizers, vapor filters, and liquid flow controllers.

Vaporizers

MSP's exclusive technology offers a broad range of advantages over older, more conventional techniques. Our Turbo-Vaporizers apply advanced technology in aerosol science and thermo-dynamics to create a more refined solution to vaporization. In thin film applications, the stable and uniform vapor leads to a higher quality thin film and higher wafer yields. The precision and control of the vaporizer makes it possible to vaporize difficult precursors, which were not usable before, opening up new areas for process development.

MSP provides nine direct liquid injection vaporizer options to meet the varying applications. The vaporizers are ideal for process that require a high quality, stable vapors, some of which include:

  • Semiconductor Microelectronics
  • LEDs Optoelectronics
  • Protective Coatings
  • Nanoparticle Synthesis
  • EnergyProduction/Storage
  • Powder/Fiber Processing
  • Solar Photovoltaic
  • Medical Device
  • Bio Assays

Filters

In microelectronics, unwanted particles can mean low yields and field failures. As semiconductor manufacturing nodes get smaller and smaller, the ‘killer’ particle (a particle that can disrupt the current and therefore destroy the semiconductor) is in the nanometer size range. Best practice is to use a filter downstream of vapor and gas sources for risk mitigation. MSP’s patent-protected VPG™ Vapor Process Gas filters provide ultra-high efficiency in the nanometer size range while also creating minimal pressure drop. These 100% Stainless Steel filters are thermally and chemically resistant.

Liquid Flow Controllers

MSP’s Turbo-Vaporizer™ Vapor Deliver Solutions use a direct liquid injection technique and require precise control of the liquid flow rate into the vaporizer. A fast response liquid flow controller that can tightly control flow-rates is needed for most microelectronic and thin film applications. Our PE vaporizers use a precision Piezo-valve to control the rate of liquid flow to the vaporizer, significantly reducing dead volume and improving response time. MSP’s versatile Liquid Flow Controller can be used to control the on-board Piezo valve in PE vaporizers. It can be used to maintain a highly stable liquid flow, or generate repeatable short duration vapor pulses for ALD (Atomic Layer Deposition) and short pulse CVD (Chemical Vapor Deposition) applications.