Better Vaporization – More Process Options
Vaporizers are used in gas phase processes to transition a liquid into a gas for thin film deposition or other processes that require a vapor (metal etch, doped epitaxial growth, etc). Vaporizers are widely used in:
MSP Turbo™ Vaporizers use a droplet vaporization, direct liquid injection technique. Our vaporizers (also known as liquid source bubblers or CVD bubblers) use advanced technology in aerosol science and thermo-dynamics to create a more refined solution to vaporizing liquids.
In thin film applications, MSP Turbo™ Vaporizers’ stable and uniform vapor leads to a higher quality thin film and higher wafer yields with less down time. MSP Turbo™ Vaporizers provide faster response time, high precision flow control, are able to operate at high temperatures, and are built with a clog-resistant design.
Use our interactive product selector to find the right vapor delivery solution for your CVD thin film application.
Learn more by downloading our white paper on reducing CVD defects with post-vaporization filtration
MSP's Turbo II™ Vaporizer 2855PE is designed for high-precision microelectronic...
MSP's Turbo II™ Vaporizer 2855NP is designed for applications that require mid...
MSP's Turbo II™ Vaporizer 2852PE is designed for high-precision microelectronic...
MSP's Turbo II™ Vaporizer 2852NP is designed for applications that require low to...
The 2821 MSP Turbo™ Vaporizer is our highest liquid flow rate unit. This model features...