Empowers Data-Driven Decisions in UPW Monitoring...Like Never Before

The TSI Nano LPM™ System Advances Process Control Detection to 10 nm

---

Request Sales Assistance   |   View FAQs   |   View Product Specification Sheet

---

The TSI Nano LPM™ System offers continuous monitoring of semiconductor ultrapure water (UPW) quality with true 10 nanometer (nm) nanoparticle detection. Empowering engineering and quality control personnel to confidently make real-time, data-driven decisions.

UPW Monitoring Challenges

Real-time detection of nanoparticles critically important as they impact yield and product quality. The problem is, traditional optical based technologies struggle to detect particulate contamination below 20 nm in UPW. Material refractive index problems and interference from microbubbles can lead to false and inconsistent readings.

Patented Technology — Aerosolize the Particles

The Nano LPM™ System uses a patented Nano LPM Particle Generator, which consistently aerosolizes UPW before drying the droplets into solid nanoparticles. They are then analyzed using the Nano LPM Water-Based Condensation Particle Counter (CPC) specifically engineered for use in cleanroom environments.

Advantages

• Consistently monitor and characterize UPW at multiple locations simultaneously — multi -instrument repeatability
• Enables proactive, data-driven measures safeguarding product quality — reliable detection down to 10 nm
• Confidence in the data — no more uncertainties over relative refractive index issues, false counts from bubbles or contamination of optical surfaces
• Calibrated using particles that better represent UPW contamination — uses 10 nm silica size standards
• Designed for use in semiconductor and cleanroom environments — CPC uses water as the working fluid not butanol
• Peace of mind — quick point of use check using Nano LPM™ System onboard injection port

Applications

• Monitor and trend UPW final polish quality and at multiple steps in the UPW purification process
• Detect particle excursions (e.g. breakthrough)
• Improve preventative maintenance cycles by evaluating UPW filter and resin efficiencies over time
• Optimize rinse-down times after UPW system maintenance

Where to Install

Check out Application Note: UPW Monitoring Locations for the TSI Nano LPM™ System (View US | View A4) to read about the variety of installed monitoring locations for enhanced process control.

Want to Know More About the TSI Nano LPM™ System?

Submit the form below and a TSI Representative will be in touch soon. Thank you.