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Liquid Flow Controllers With Valves 2950V

UGS: 2950-01V Designed specifically for leading edge microelectronic applications, the Turbo™ Liquid Flow Controllers 2950V pair with MSP's Turbo II™ Vaporizers to provide unmatched liquid source vapor delivery performance for semiconductor thin film deposition processes (including CVD, PECVD, ALD, and MOCVD).

Product Details

The Turbo™ Liquid Flow Controllers 2950V feature a custom-engineered high-precision, high-speed flow sensor and meticulously designed flow control electronics. These components deliver world-class performance essential for advanced semiconductor processing.

Precision Flow Control

The 2950 LFCs contain flow sensors and liquid control electronics to control the Piezo valve on MSP’s Turbo II™ Vaporizers. For vaporizers without an on-board liquid control Piezo valve, a 2950V series Turbo™ LFC can be used.

Applications

  • Semiconductor thin film deposition processes
    • Chemical vapor deposition (CVD)
    • Plasma-enhanced chemical vapor deposition (PECVD)
    • Atmoic layer deposituion (ALD)
    • Metal-organic chemical vapour deposition (MOCVD)
  • Applications with requirements of frequent flow rate adjustments

Features and Benefits

  • Precision flow control and adjustability
  • Exceptional accuracy and linearity
  • Ultra-fast response time
  • Superior repeatability
  • Wide flow range options

Turbo™ LFC Models Available

Model Number TEOS Full Scale* (g/min) TEMAZr Full Scale (g/min) H2O Full Scale (g/min) Request a Quote
2950-002V 0.2 n/a 0.14 Request a Quote
2950-01V 1 0.19 0.73 Request a Quote
2950-05V 5 0.95 3.6 Request a Quote
2950-10V 10 1.9 7.3 Request a Quote
2950-20V 20 3.8 14 Request a Quote
2950-30V 30 5.7 21 Request a Quote

Nominal max flow determined using TEOS as reference liquid at 23±2°C. Flow rate range is a function of specified liquid.

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Spec Sheets

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