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Meet Tomorrow's Challenges
with Nanoscale Expertise
When you imagine a more efficient and effective way to get the most from your chip manufacturing, MSP, a Division of TSI®, is leading the cutting edge of semiconductor vaporization technology.
MSP offers a complete line of vaporization products for liquid source vaporization in gas-phase processing, such as:
Our products are used in semiconductor device fabrication and industrial coating applications.
MSP's exclusive technology offers a broad range of advantages over older, more conventional techniques. The development of our new line of MSP Turbo II™ Vaporizers is inspired by breakthroughs in the science of droplet atomization and use a direct liquid injection (DLI) technique. Designed to meet modern demanding vaporization needs, these innovative vaporizers are half the physical footprint of earlier versions, while delivering a staggering 200% increase in vapor output.
In thin film applications, the stable and uniform vapor leads to a higher quality thin film and higher wafer yields.
The precision and control of our clog-resistant vaporizer makes it possible to vaporize difficult precursors, which were not usable before, opening up new areas for process development. The unique design provides longer, stable operation resulting in less down time and more money saved for users.
More About Turbo II™ Vaporizers
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In addition to vaporizers, MSP also offers vapor process gas filters and liquid flow controllers.
MSP's chemically and thermally resistant vapor/gas filters are specifically designed for low pressure and high temperature applications, providing reliable filtration even for chemically aggressive vapors/gases. The filters are designed to have extremely low pressure drops, making it easier to work in an ultra-low pressure environment. Pump down is faster, and lower pressures are possible.
Our versatile liquid flow controllers can be used to control the on-board liquid controller in PE vaporizers. It can be used to maintain a steady liquid flow, or to generate repeatable short duration vapor pulses for ALD applications.