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SPx-Calibration-Standards

SPx-Calibration-Standards

MSP's SPx Calibration Standards are precision engineered tools for the calibration, verification and re-qualification of the most common wafer surface inspection systems used in semiconductor manufacturing. These standards play a crucial role in ensuring the accuracy and...

Main Sources of Particle Shedding and Possible Impacts on Yield

Main Sources of Particle Shedding and Possible Impacts on Yield

Understanding the sources of particle shedding and impacts on yield is essential for effective mitigation strategies.

Turbo Vaporizer 2821

Turbo Vaporizer 2821

The 2821 MSP Turbo™ Vaporizer is our highest liquid flow rate unit. This model features 2400W of heater power and can be used to deliver flow rates up to 6000g/hr (TEOS or equivalent).

Prioritize Precision and Reliability for Maximum Safety in Aerospace and Defense

Prioritize Precision and Reliability for Maximum Safety in Aerospace and Defense

From the meticulous assembly of satellites and spacecraft to the intricate fabrication of composite materials for jet engines, every step demands seamless integration of cutting-edge technology and expert craftsmanship, based on precision and reliability. Avionics systems...

Achieve a Breakthrough in ALD Process for Cobalt Thin-Film Deposition

Achieve a Breakthrough in ALD Process for Cobalt Thin-Film Deposition

MSP transformed cobalt thin-film deposition for a global semiconductor giant struggling with CCTBA vaporization, including low vapor pressure and thermal instability, leading to clogging and downtime.

Boost Throughput in CVD & ALD by Reducing Liquid Waste

Boost Throughput in CVD & ALD by Reducing Liquid Waste

With its rapid response time and advanced feedback capabilities, the Turbo™ LFC is set to revolutionize CVD and ALD processes.

AeroTrak-Plus Remote Particle Counter 7000 Series

AeroTrak-Plus Remote Particle Counter 7000 Series

流速0.1 CFM(2.83LPM),1 CFM(28.3 LPM)/通道粒径选项0.2-25μm

Dev-Dep Development Reticle Contamination Standards

Dev-Dep Development Reticle Contamination Standards

Reticle/photomask contamination standards consist of particles deposited on 6 inch reticles with the industry's best particle size and count control. These certified standards for reticle inspection tools are totally customized for each customer.

Dev-Dep Development Wafer Contamination Standards

Dev-Dep Development Wafer Contamination Standards

Wafer contamination standards consist of particles deposited on a wafer (sizes from 100 mm to 450 mm) with the industry's best particle size and count control. These certified standards for wafer inspection tools are totally customized for each customer.


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