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MSP offers a complete line of vaporization products for liquid source vaporization in gas-phase processing, such as Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD).
The Turbo II™ Vaporizers are designed to vaporize a wide range of liquids, including thermally sensitive and low vapor pressure substances, ensuring versatility and efficiency in thin film deposition processes. Achieve stable processes for reliable results, increase deposition rates for higher throughput, and lower ownership costs with minimal customer issues.
产品
High-Flow Turbo II Vaporizer 2855NP
High-Flow Turbo II Vaporizer 2855PE
Low-Flow Turbo II Vaporizer 2852NP
Low-Flow Turbo II Vaporizer 2852PE
Turbo Vaporizer 2821
