Vaporizers

MSP offers a complete line of vaporization products for liquid source vaporization in gas-phase processing, such as Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD).

The Turbo II™ Vaporizers are designed to vaporize a wide range of liquids, including thermally sensitive and low vapor pressure substances, ensuring versatility and efficiency in thin film deposition processes. Achieve stable processes for reliable results, increase deposition rates for higher throughput, and lower ownership costs with minimal customer issues.

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High-Flow Turbo II Vaporizer 2855NP

MSP's Turbo II™ Vaporizer 2855NP is designed for applications that require mid to...

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High-Flow Turbo II Vaporizer 2855PE

MSP's Turbo II™ Vaporizer 2855PE is designed for high-precision microelectronic...

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Low-Flow Turbo II Vaporizer 2852NP

MSP's Turbo II™ Vaporizer 2852NP is designed for applications that require low to mid...

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Low-Flow Turbo II Vaporizer 2852PE

MSP's Turbo II™ Vaporizer 2852PE is designed for high-precision microelectronic...

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Turbo Vaporizer 2821

The 2821 MSP Turbo™ Vaporizer is our highest liquid flow rate unit. This model features...

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