TSI Incorporated, a leader in precision measurement instruments, is introducing the TSI Nano LPM™ System (Nanoparticle Liquid Particle Monitor) for true 10 nanometer (nm) nanoparticle detection in semiconductor ultrapure water (UPW). The Nano LPM™ System offers continuous monitoring of UPW quality, empowering engineering and quality control personnel to confidently make real-time, data-driven decisions.
UPW is used for cleaning wafers and equipment as well as for etching and removing contaminants in semiconductor processes to ensure high quality production. Particles as small as 10 nm impact yield and product quality, making real-time detection of nanoparticles critically important. The industry challenges are that traditional optical based technologies struggle to detect any nanoparticles below 20 nm due to particle material refractive index problems and interference from microbubbles which can lead to false and inconsistent readings. The TSI Nano LPM System overcomes these challenges by reliably detecting nanoparticles down to 10 nm, providing consistent, real-time insights that are crucial for detecting any change in UPW quality.
The TSI Nano LPM System sets a new standard in UPW nanoparticle monitoring by delivering reliable, consistent and accurate particle monitoring data at 10 nm. The Nano LPM System uses a patented particle generator, which aerosolizes UPW before drying the droplets that leave behind solid nanoparticles. The nanoparticles are then analyzed using the Nano LPM Water-Based Condensation Particle Counter (CPC) specifically engineered for use in cleanroom environments.
The TSI Nano LPM Sytem offers several advanced capabilities to meet semiconductor manufacturers challenges:
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