Nanoparticle Monitoring in Ultra-Pure Water

TSI Nano LPM™ System Advances Process Control Detection to 10 nm

TSI Incorporated, a leader in precision measurement instruments, is introducing the TSI Nano LPM™ System (Nanoparticle Liquid Particle Monitor) for true 10 nanometer (nm) nanoparticle detection in semiconductor ultrapure water (UPW). The Nano LPM™ System offers continuous monitoring of UPW quality, empowering engineering and quality control personnel to confidently make real-time, data-driven decisions.

Addressing UPW Monitoring Challenges

UPW is used for cleaning wafers and equipment as well as for etching and removing contaminants in semiconductor processes to ensure high quality production. Particles as small as 10 nm impact yield and product quality, making real-time detection of nanoparticles critically important. The industry challenges are that traditional optical based technologies struggle to detect any nanoparticles below 20 nm due to particle material refractive index problems and interference from microbubbles which can lead to false and inconsistent readings. The TSI Nano LPM System overcomes these challenges by reliably detecting nanoparticles down to 10 nm, providing consistent, real-time insights that are crucial for detecting any change in UPW quality.

Patented Technology — Aerosolize the Particles

The TSI Nano LPM System sets a new standard in UPW nanoparticle monitoring by delivering reliable, consistent and accurate particle monitoring data at 10 nm. The Nano LPM System uses a patented particle generator, which aerosolizes UPW before drying the droplets that leave behind solid nanoparticles. The nanoparticles are then analyzed using the Nano LPM Water-Based Condensation Particle Counter (CPC) specifically engineered for use in cleanroom environments. 

Key Advantages

The TSI Nano LPM Sytem offers several advanced capabilities to meet semiconductor manufacturers challenges:

• Enables semiconductor manufacturers to take proactive, data-driven action before product quality is affected — ensuring reliable detection down to 10 nm 
• Calibrated using silica size standards that better represent UPW contamination
• Repeatable 10 nm measurements when using multiple instruments — crucial for maintaining process control and characterizing your process at multiple locations
• Ensures reliable performance — no uncertainties in particle detection based on differences in relative refractive indices, or false counts from bubbles and contamination of optical surfaces.
• Designed for use in semiconductor and cleanroom environments — Nano LPM CPC utilizes UPW as the working fluid, ensuring it is not a source of contamination
• Uniquely enables field verification of instrument sensitivity and response rate using onboard injection port

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