Empowers Data-Driven Decisions in UPW Monitoring...Like Never Before

The TSI Nano LPM™ System — Close the UPW Metrology Gap with Confident Detection Down to 10 nm

The progression toward smaller nodes means your ultrapure water (UPW) must be purer than ever. A critical metrology gap exists where legacy liquid particle counters (LPCs), unable to detect particles below 20 nm, leave your process exposed to yield-killing nanoparticle contamination.

The TSI Nano LPM™ System closes this gap. It provides confident, real-time detection of both suspended nanoparticles and dissolved content down to 10 nm, enabling process engineers to make data-driven decisions that prevent excursions, optimize maintenance, and protect your yield.

Want to Learn More About the TSI Nano LPM™ System? Discover how to:

• Close the UPW metrology gap with advanced technology
• Achieve confident detection and linear performance
• Drive smarter, data-based decisions
• Enhance process control across key applications
• Connect with a TSI Sales Representative

Address the UPW Metrology Gap with Advanced Technology

Industry standards like SEMI F63 acknowledge that conventional LPC technology is not suitable for detecting nanoscale contaminants, identifying Nebulization and Condensation Particle Counting (NCPC) as the most promising solution. As the global leader in aerosol generation and CPC technology, TSI developed the Nano LPM™ System to directly address this industry-wide challenge.

Our system uses a proven method to deliver a complete contamination picture:

1. Nebulization: UPW enters the Nano LPM Particle Generator and is converted into nanodroplets containing both solid particles and dissolved molecular contamination.
2. Evaporation: The nanodroplets are dried, leaving behind airborne solid particles and smaller molecular clusters that form from dissolved content
3. Detection: A Nano LPM Condensation Particle Counter (CPC) measures the resulting aerosol particles, reliably counting contamination ≥ 10 nm.

back to top

Confident Detection, Linear Performance, and Data-Driven Decisions

The TSI Nano LPM™ System provides linear, matching, and repeatable performance you can trust. It empowers you to move from reactive troubleshooting to proactive process control.

• Enable Data-Driven Maintenance: Reliably monitor the rinse-down process after filter or resin replacement. Know the exact moment a unit is ready for service, cutting downtime from weeks to days.
• Pinpoint Contamination Sources: Distinguish small but significant differences in water quality between various points in your polish loop, from the main supply to the point-of-use.
• Validate System Improvements: Measure the direct impact of UPW system upgrades. Our system provides definitive data showing a reduction in contamination, justifying capital investments.
• Gain Confidence in Your Data: Nano LPM™ System eliminates the uncertainties of refractive index issues and false counts from microbubbles that plague optical-based systems.

back to top

Key Applications for Enhanced Process Control

The TSI Nano LPM™ System provides critical insights across your entire UPW system.

• Baseline monitoring for fab mains, laterals, and return lines
• Real-time detection of particle excursions and breakthrough events
• UPW system maintenance and efficiency evaluation
• Optimization of rinse-down times for filters and resin beds

back to top

Submit the form below and a TSI Representative will be in touch soon. Thank you.