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Twice the Output, Half the Size
MSP, a division of TSI®, offers a completely new line of Vaporizers for liquid source vaporization in gas-phase processing such as Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) used in semiconductor device fabrication and industrial coating applications.
Higher Throughput & Less Waste
MSP Turbo II™ Vaporizers offer higher throughput by delivering higher vapor concentrations for faster deposition and etch rates. Additionally, when paired with the high-speed MSP Turbo™ Liquid Flow Controller (LFC), the vapor delivery system provides fast response times, reducing liquid waste and wafer processing times.
Half the Size
Extensive fluid dynamic and thermodynamic research focused on speeding liquid evaporation rates resulted in the ability to increase vapor out by 200 %, while reducing the size of the heat exchanger by 50 %; Moore’s law demonstrated in vaporization technology.
Turbo II™ Vaporizers deliver highly stable vapor concentration output, making them suitable even for highly sensitive processes like PECVD. Highly stable vapor delivery is also critical for reliable, long-term field performance.
MSP Turbo II™ Vaporizers are designed to last the lifetime of the tool or system they are installed in. They are a component, not just a consumable.
Lower Cost of Ownership
The long lifetime, higher throughput and reduced liquid waste can result in substantial cost savings over the lifetime of the processing system. Turbo II™ Vaporizers frequently require much less routine maintenance than competitive solutions.
Work Well for Difficult (and Easy) to Vaporize Liquids
A wide array of liquids can be vaporized with the MSP Turbo II™ Vaporizers. This flexibility enables vaporization of difficult precursors, like low vapor pressure liquids, which may have a tight window between thermal decomposition and vaporization at concentrations necessary for processing.
Advanced Vaporization Technology
MSP Turbo II™ Vaporizers use a droplet vaporization, direct liquid injection (DLI) technique designed to meet modern demanding vaporization needs. In thin film applications, the stable and uniform vapor leads to a higher quality thin film and higher wafer yields.
Don't miss your chance to revolutionize your CVD and ALD processes with the MSP Turbo II™ Vaporizers. Expand your liquid processing options and build deposition systems that have more capability, stability and reliability. Fill out the form below to request your new Turbo II™ Vaporizer and elevate your process module to the next level!