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Meet Tomorrow's Challenges with Nanoscale Expertise
When you know what you need to design or validate your inspection equipment to increase yield, MSP, a Division of TSI®, will provide calibration standards that no one else can provide.
Offering particle deposition equipment, services, and particle suspensions, MSP provides a full suite of particle deposition and metrology products.
The advanced 2300G3 Particle Deposition System sets the standards for wafer inspection and metrology equipment that will help increase yield of leading-edge devices for years to come, yet this complete system can be used now to meet today’s measurement needs, including:
MSP provides certified Wafer and Reticle Contamination Standards for calibrating, qualifying, and monitoring wafer and photomask inspection systems. Particles of specified size, composition, and count are deposited on a bare silicon wafer or your substrate of choice, including wafers, photomasks/reticles (any type), and HDD disks. Particles can be deposited on bare, film, and patterned wafers from 100 mm to 300 mm.
MSP is a leader in the industry, providing advanced technology to cover customers’ particle/calibration needs, including:
MSP is a leader in the industry, providing advanced technology to cover customers’ particle/calibration needs.
Whether testing for particle size, count, or composition, it is imperative to use reliable particle suspensions to calibrate your surface scanning equipment or particle counters. A particle standard consists of a specific size range and number concentration of solid particles suspended in ultra-pure water (UPW). This suspension is dispersed into clean air or nitrogen and deposited onto wafers and reticles in specific patterns and sizes.
Particle Standards are used to produce high-quality contamination standards for calibrating, qualifying, and monitoring the performance of wafer and photomask inspection systems.