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Finding the Right-sized Vaporization Solution
For a global CVD equipment manufacturer, finding the right-sized vaporization solution was essential to meet the demands of their thin film SiO2 deposition application. With over 1,000 employees and a market cap exceeding $1 billion, this company needed a solution that could deliver fast deposition rates of silicon dioxide (up to 10 g/min TEOS), seamless integration into their gas box, and minimal maintenance requirements.
Addressing Particle Specification Challenges and Vapor Stability Issues
Persistent particle problems plagued their existing process, and limited space within the gas box made finding a suitable vaporizer a daunting task. Controlling vapor stability with precision was also proving difficult with their current vapor delivery setup. Not meeting the particle specifications jeopardized a critical Joint Development Program (JDP) with a major NAND memory manufacturer.
Resolving Defects and Enhancing Reliability of Thin Film Deposition
Leveraging their specialized expertise in vaporization technology, the MSP vaporizer specialist and design engineering team worked closely with the vapor and gas delivery design team of the OEM manufacturer to tailor a solution to their specific needs. The result was impressive: By implementing the customized vaporization solution, the semiconductor manufacturer saw immediate improvements and allowed them to qualify the process at their customer’s site. The new vaporizer resolved their particle problem, ensuring a low-defect, highly uniform thin-film solution. Its compact design seamlessly integrated into their existing setup, occupying minimal space within the gas box. Additionally, the vaporizer has excellent field performance and required virtually no maintenance, allowing the company to install it and forget about it, freeing up valuable time and resources.
Twice the Output, Half the Size
MSP, a Division of TSI®, offers a completely new line of Turbo II™ Vaporizers for liquid source vaporization in CVD and ALD. They enable you to vaporize difficult precursors, like low vapor pressure liquids, which may have a tight window between thermal decomposition and vaporization at concentrations necessary for processing. |
Instantaneous Vapor Generation and Process Control
One of the most impressive features of MSP's vaporization solution was its quick response time. With instantaneous vapor generation, the manufacturer experienced enhanced process control and efficiency, leading to increased productivity and yield.
The impact of this partnership helped to boost them to a 54% CAGR in single wafer processing over four years. Not only did the semiconductor manufacturer see a marked improvement in their processes, but they also gained a competitive edge in the market. With thousands of units sold, they were able to expand their market share and solidify their position as a leader in the industry.
Enhancing Efficiency in Semiconductor Manufacturing
In summary, MSP's vaporization solution revolutionized semiconductor thin film deposition for this global manufacturer. By addressing their specific particle specification challenges and delivering highly reliable results, MSP not only met but exceeded their expectations. Through innovation, collaboration, and a commitment to excellence, MSP empowered their customer to achieve new heights of success in semiconductor manufacturing.
Discover more about TSI/MSP solutions for ensuring precision, quality control, and reliability in advanced semicondutor manufacturing!