Deposition Services

Precision Particle Deposition for Semiconductor Inspection and Process Control

MSP, a Division of TSI, provides high-quality wafer and reticle contamination standards to support every stage of semiconductor inspection system lifecycle — from development to qualification, calibration, and performance evaluation. Each contamination standard is created with precise particle size, composition, and count control to ensure repeatable, traceable results and help you achieve consistent tool performance and higher yield.

Dev-Dep™ Development Contamination Standards: Customized particle deposition designed to simulate real-world contamination and accelerate tool and process development.

Qual-Dep™ Qualification Contamination Standards: Tool-specific standards to verify performance before deployment and reduce acceptance risk.

Cal-Dep™ Calibration Contamination Standards: Traceable, repeatable calibration standards for maintaining consistent tool performance over time.

PRE - Particle Removal Efficiency Testing: Challenge wafers with controlled particle deposits to evaluate and optimize wafer cleaning processes.