Liquid Particle Instrument

Ultra-pure water (UPW) is essential in semiconductor manufacturing for cleaning wafers and equipment, as well as for etching and contaminant removal to maintain high-quality production. Nanoparticles as small as 10 nm can impact yield and product integrity, making real-time detection critical.

Traditional optical-based technologies struggle to detect particles below 20 nm due to refractive index limitations and interference from microbubbles, leading to false or inconsistent readings. Available newer instrument technology, like TSI’s Nano LPM™ System, overcomes these challenges by reliably detecting nanoparticles down to 10 nm, delivering consistent, real-time insights to monitor UPW quality effectively.