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*Diese Seite ist leider nur in Englisch verfügbar.*This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high...

*Diese Seite ist leider nur in Englisch verfügbar.*Filtration down to 1 nm and below

*Diese Seite ist leider nur in Englisch verfügbar.*PRE Challenge Photomasks offer a cost-effective solution for Particle Removal Efficiency (PRE) testing, ensuring dependable validation of cleaning systems.

*Diese Seite ist leider nur in Englisch verfügbar.*This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 20 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high...

Durchflussrate 28.3 LPM (1 CFM)  - 100 LPM (3,5 CFM) / Kanalgrößen 0,3 µm bis 10 µm,(6) vom Benutzer wählbare Kanäle

Process Particles™ Suspensions are used as particle material standards. They represent real-world contaminant particles encountered in semiconductor device fabrication processing.