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*Diese Seite ist leider nur in Englisch verfügbar.*The 2821 Turbo-Vaporizer™ is our highest liquid flow rate unit. This model features 3600W of heater power and can be used to deliver flow rates up to 6000g/hr (TEOS or equivalent).

From the meticulous assembly of satellites and spacecraft to the intricate fabrication of composite materials for jet engines, every step demands seamless integration of cutting-edge technology and expert craftsmanship, based on precision and reliability. Avionics systems...

Explore the crucial yet often overlooked realm of photomask contamination standards in semiconductor manufacturing.

Real-time monitoring ensures compliance, aids in root cause analysis, and supports continuous improvement, enhancing overall operational efficiency and regulatory adherence.

MSP's Particle Removal Efficiency (PRE) standards optimize cleaning, alerting when attention needed to avoid contamination-related losses.

Continuing to use wafers with unknown performance introduces risk. Our recertification service provides NIST-traceable verification of your contamination wafers.

Durchfluss 0,1 CFM (2,83 LPM), 1 CFM (28.3 LPM) / Kanalgrößenoptionen 0,2 bis 25 μm

*Diese Seite ist leider nur in Englisch verfügbar.*Reticle/photomask contamination standards consist of particles deposited on 6 inch reticles with the industry's best particle size and count control. These certified standards for reticle inspection tools are totally...

*Diese Seite ist leider nur in Englisch verfügbar.*Wafer contamination standards consist of particles deposited on a wafer (sizes from 100 mm to 450 mm) with the industry's best particle size and count control. These certified standards for wafer inspection tools are totally...