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Surface defect inspection for masks ensures high-quality lithography by detecting and addressing imperfections. Advanced inspection systems improve yield and efficiency in semiconductor manufacturing.

Process Particles™ Suspensions are used as particle material standards. They represent real-world contaminant particles encountered in semiconductor device fabrication processing.

This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 20 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom contamination standards. Manual loading...

流速 1 CFM (28.3 LPM) - 3.5 CFM (100 LPM) / 通道粒径 0.3 µm to 10 µm,(6)个用户可选通道